W.J.Park, H.J.Kim, J.H.Lee, J.H.Kim, J.H.Kim, S.H.Uhm, S.W.Kim, H.C.Lee; Characterization of HZO Films Fabricated by Co-Plasma Atomic Layer Deposition for Ferroelectric Memory Applications, nanomaterials. 14 (2024) 1801 

S.W.Kim, J.H.Yoo, W.J.Park, C.H.Lee, J.H.Lee, J.H.Kim, S.H.Uhm, H.C.Lee; Enhancing Charge Trapping Performance of Hafnia Thin Films Using Sequential Plasma Atomic Layer Deposition, nanomaterials. 14 (2024) 1686

S.W.Kim, H.S.Lee, D.S.Jun, S.E.Lee, J.H.Lee, H.C.Lee; Enhancing the Plasma-Resistance Properties of Li₂O-Al₂O₃-SiO₂ Glasses for the Semiconductor Etch Process via Alkaline Earth Oxide Incorporation, Materials. 16 (2023) 5112 

J.H.Yoo, W.J.Park, S.W.Kim, G.R.Lee, J.H.Kim, J.H.Lee, S.H.Uhm, H.C.Lee; Preparation of Remote Plasma Atomic Layer-Deposited HfO2 Thin Films with High Carge Trapping Densities and Their Application in Nonvolatile Memory Devices, Nanomaterials. 13 (2023) 1785

J.H.Lee, G.S.Lee, E.N.Park, D.H.Jo, S.W.Kim, H.C.Lee; Synthesis of Planar-Type ZnO Powder in Non-Nano Scale Dimension and Its Application in Ultraviolet Protection Cosmetics, Materials. 16 (2023) 2099

D.H.Hong, J.H.Yoo, W.J.Park, S.W.Kim, J.H.Kim, S.H.Uhm, H.C.Lee; Characteristics of Hf0.5Zr0.5O2 Thin Films Prepared by Direct and Remote Plasma Atomic Layer Deposition for Application to Ferroelectric Memory, Nanomaterials. 13 (2023) 900

S.W. Kim, H.C. Lee; Development of PZN-PMN-PZT Piezoelectric Ceramics with High d₃₃ and Q_m Values, Materials. 15 (2022) 7070

S.L. Park, J.G. Kim, T.W. Han, D.Y. Hwang, H.C. Lee, W.B. Kim; Mechanical reinforcement of UV-curable polymer nanocomposite for nanopatterned mold, Microelectronic Engineering. 259 (2022) 11179

H.G. Kim, D.H. Hong, J.H. Yoo, H.C. Lee; Effect of Process Temperature on Density and Electrical Characteristics of Hf_0.5Zr_0.5O₂ Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition, Nanomaterials. 12 (2022) 548

S.W. Kim, H.C. Lee; Design and Preparation of Self-Oscillating Actuators Using Piezoelectric Ceramics with High Coupling Factors and Mechanical Quality Factors, Micromachines. 13 (2022) 158

S.Y. Park, S.H. Rho, H.S. Lee, K.M. Kim, H.C. Lee; Fabrication of Highly Porous and Pure Zinc Oxide Films Using Modified DC Magnetron Sputtering and Post-Oxidation, Materials. 14 (2021) 6112

S. W. Kim, H. C. Lee; Piezoelectric Ceramics with High d33 Constants and Their Application to Film Speakers, Materials. 14 (2021) 5795 

S.Y. Park, M.J. Kim, and H.C. Lee; Computational Fluid Dynamics Simulation, Microelectromechanical System Fabrication, and Radio-Frequency Evaluation of the PM2.5 Fine Dust Sensor Based on the Surface Acoustic Wave Resonator, J. Nanoelectron. Optoelectron. 16 (2021) 715 

J. H. Lee, G. S. Lee, E. N. Park, S. E. Hong, S. B. Kye, S. W. Kim, J. Y. Gwack, and H. C. Lee; Preparation and Characterization of Planar-Type ZnO Powder with High Aspect Ration for Application in Ultraviolet- and Heat-Shield Cosmetics, J. Nanosci. NanoTechnol. 21 (2021) 1897

S. H. Rho, H. G. Kim, S. Y. Park, H. C. Lee; Study on the mechanism for the deposition of a porous zinc thin flm by using a modifed DC magnetron sputtering system, J. Kor. Phys. Soc. 78 (2021) 679

M. J. Kim, G. H. Kim, H. C. Lee; Tri-Doping of Sol-Gel Synthesized Garnet-Type Oxide Solid-State Electrolyte, Micromachines. 12 (2021) 134

G. H. Kim, M. J. Kim, H. B. Kim, J. H. Ryu, and H. C. Lee; Preparation and Characterization of Sol?Gel-Driven LixLa3Zr2O12 Solid Electrolytes and LiCoO2 Cathodes for All-Solid-State Lithium-Ion Batteries, J. Nanosci. NanoTechnol. 20 (2020) 7002

Y. H. Sung, J. M. Park, E. S. Choi, H. C. Lee, and H. Lee; Improved Light Extraction Efficiency of Light-Emitting Diode Grown on Nanoscale-Silicon-Dioxide-Patterned Sapphire Substrate, Sci. Adv. Mater. 12 (2019) 647

S. W. Kim, Y. J. Jeong, and H. C. Lee; Effects of Zn/Ni Ratio and Doping Material on Piezoelectric Characteristics of Pb((Zn,Ni)1/3Nb2/3)O3-Pb(Zr,Ti)O3Ceramics, Sci. Adv. Mater. 12 (2019) 237

J. H. Kim, S. Y. Park, and H. C. Lee; A Study on Computational Fluid Dynamic Simulations to Improve the Thickness Uniformity of Porous Metal Films Deposited by Using Cluster Sputtering, J. Kor. Phys. Soc. 76 (2019) 27